Defect distribution in boron doped silicon nanostructures characterized by means of scanning spreading resistance microscopy

Prüßing J, Böckendorf T, Hamdana G, Peiner E, Bracht H

Research article (journal) | Peer reviewed

Details about the publication

JournalJournal of Applied Physics
Volume127
StatusPublished
Release year2020
Language in which the publication is writtenEnglish
DOI10.1063/1.5134558

Authors from the University of Münster

Böckendorf, Tim
Professorship of Materials Physics (Prof. Wilde)
Bracht, Hartmut
Institute of Materials Physics
Prüßing, Jan Kristen
Professorship of Materials Physics (Prof. Wilde)