Fluctuation electron microscopy on silicon amorphized at varying self ion-implantation conditions
Radić D, Hilke S, Peterlechner M, Posselt M, Bracht H
Research article (journal) | Peer reviewedDetails about the publication
Journal: Journal of Applied Physics
Volume: 126
Status: Published
Release year: 2019
Language in which the publication is written: English
DOI: 10.1063/1.5107494
Authors from the University of Münster
| Bracht, Hartmut | |
| Hilke, Sven | |
| Peterlechner, Martin | |
| Radic, Dražen |