Diffusion-induced recrystallization in nickel/palladium multilayers

Kasprzak M., Baither D., Schmitz G.

Research article (journal) | Peer reviewed

Abstract

In size-mismatched thin film interdiffusion couples diffusion-induced recrystallization (DIR) occurs rather than conventional Fickianatomic transport. Grains formed in this process have characteristic composition levels that are so far not understood. In this work, DIRis studied in sputter-deposited Ni/Pd films. By pre-alloying one side of the diffusion couple, the mismatch, and thus the driving force, arevaried. After heat treatment, transmission electron microscopy, energy-dispersive X-ray spectroscopy and X-ray diffractometry demonstraterecrystallization. Characteristic concentration levels are derived from X-ray diffraction data. Remarkably, the concentration insidenewly formed grains shifts coherently to the concentration inside the parent layers. We demonstrate that the observed concentration levelsare in agreement with a recently published thermomechanical model.

Details about the publication

JournalActa Materialia
Volume59
Page range1734-1741
StatusPublished
Release year2011
Language in which the publication is writtenEnglish
DOI10.1016/j.actamat.2010.11.040
KeywordsMetallic thin films; diffusion-induced recrystallization; X-ray diffraction (XRD); Ideal shear strength; NiPd

Authors from the University of Münster

Baither, Dietmar
Professur für Materialphysik I (Prof. Schmitz)
Kasprzak, Michael
Institute of Materials Physics
Schmitz, Guido
Institute of Materials Physics