Diffusion-induced recrystallization in nickel/palladium multilayers

Kasprzak M., Baither D., Schmitz G.

Forschungsartikel (Zeitschrift) | Peer reviewed

Zusammenfassung

In size-mismatched thin film interdiffusion couples diffusion-induced recrystallization (DIR) occurs rather than conventional Fickianatomic transport. Grains formed in this process have characteristic composition levels that are so far not understood. In this work, DIRis studied in sputter-deposited Ni/Pd films. By pre-alloying one side of the diffusion couple, the mismatch, and thus the driving force, arevaried. After heat treatment, transmission electron microscopy, energy-dispersive X-ray spectroscopy and X-ray diffractometry demonstraterecrystallization. Characteristic concentration levels are derived from X-ray diffraction data. Remarkably, the concentration insidenewly formed grains shifts coherently to the concentration inside the parent layers. We demonstrate that the observed concentration levelsare in agreement with a recently published thermomechanical model.

Details zur Publikation

FachzeitschriftActa Materialia
Jahrgang / Bandnr. / Volume59
Seitenbereich1734-1741
StatusVeröffentlicht
Veröffentlichungsjahr2011
Sprache, in der die Publikation verfasst istEnglisch
DOI10.1016/j.actamat.2010.11.040
StichwörterMetallic thin films; diffusion-induced recrystallization; X-ray diffraction (XRD); Ideal shear strength; NiPd

Autor*innen der Universität Münster

Baither, Dietmar
Professur für Materialphysik I (Prof. Schmitz)
Kasprzak, Michael
Institut für Materialphysik
Schmitz, Guido
Institut für Materialphysik