Continuum modeling of ion-beam eroded surfaces under normal incidence: Impact of stochastic fluctuations

Dreimann K, Linz SJ

Abstract

Using a recently proposed field equation for the surface evolution of ion-beam eroded semiconductor target materials under normal incidence, we systematically explore the impact of additive stochastic fluctuations that are permanently present during the erosion process. Specifically, we investigate the dependence of the surface roughness, the underlying pattern forming properties and the bifurcation behavior on the strength of the fluctuations.