The hidden link between diffusion-induced recrystallization and ideal strength of metals
Schmitz G, Baither D, Kasprzak M, Kim TH, Kruse B
Forschungsartikel (Zeitschrift) | Peer reviewedZusammenfassung
Diffusion-induced recrystallization (DIR) is a mechanism which destabilizes thin film multilayers New grains formed are distinguished by preferred composition levels characteristic for the diffusion couple By evaluating these concentrations for different material combinations, it is demonstrated that a break of coherency by spontaneous relaxation is the key to understanding the DIR process Based on this, a thermoelastic model is derived to predict whether DIR can be expected for a given multilayer and to calculate the characteristic concentration levels (C) 2010 Acta Materialia Inc. Published by Elsevier Ltd All rights reserved
Details zur Publikation
Fachzeitschrift: Scripta Materialia
Jahrgang / Bandnr. / Volume: 63
Ausgabe / Heftnr. / Issue: 5
Seitenbereich: 484-487
Status: Veröffentlicht
Veröffentlichungsjahr: 2010 (30.09.2010)
Sprache, in der die Publikation verfasst ist: Englisch
Stichwörter: Thin films multilayers Metals and alloys Diffusion-induced recrystallization Ideal shear strength grain-boundary migration driving-force copper interdiffusion mechanism alloys stress films
Autor*innen der Universität Münster
| Baither, Dietmar | Professur für Materialphysik I (Prof. Schmitz) |
| Kasprzak, Michael | Institut für Materialphysik |
| Schmitz, Guido | Institut für Materialphysik |